Effect of Reaction Gas on Micromechanical Properties of Nano-Diamond Films

Abstract Nano-diamond films were prepared by electron assisted enhanced hot metal chemical vapor deposition (HFCVD) system, CH4/H2, CH4/H2/Ar gas and four atmospheres in different proportions. The results were characterized by Raman spectroscopy and atomic force microscopy (AFM). The structure and microstructure of the film were measured by nanoindentation testing techniques. The micro-mechanical properties of the nano-diamond film were measured. The loading and unloading curves and the curves of hardness and modulus with the indentation depth were obtained. The results show that the film has obvious nanostructure characteristics. With the increase of CH4 and Ar concentration, the grain is more refined and the surface roughness is lower. The nano-diamond film prepared without Ar atmosphere has better elastic recovery, higher hardness and modulus, and the lower the content of CH4 and Ar, the higher the hardness and modulus. (Diamond and Abrasives Engineering, 2009, Issue 1)

Abstract In this paper, nanocrystalline diamond films were prepared by using CH4/H2, CH4/H2/Ar with different concentration in electron enhanced hot filament chemical vapor deposition (HFCVD) system. Scanning electron microscopy (SEM) and atom force microscopy (AFM) as well as Raman scattering spectra were employed to characterize the as-grown films. The micro-mechanical properties were measured by nano-indentation method. The uploading and downloading curves and the variety of hardness and Young's modulus with indentation depth were gained. The results showed that diamond film had a special nano-scaled structure. The higher the CH4 and Ar gas concentration, the finer the grain size and the lower the surface roughness.
The nanocrystalline diamond films deposited without Ar gas have a favorable elasticity restoring capacity and a higher average hardness and Young, s modulus. With lower CH4 and Ar gas concentration, the average hardness and Young,s modulus of the films got higher.

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