[Asia Pump Network News] Sputtering ion pump, also known as Penning pump, as the name suggests, it is the use of discharge discharge Penning. Sputtering ion pump is better vacuum equipment. Next to introduce the sputtering ion pump structural features and working principle. Sputtering ion pump structure First, the structure of the sputtering ion pump Mainly by the anode, cathode, permanent magnet and pump body composed of four parts. The anode is a honeycomb structure composed of a plurality of stainless steel cylinders. The cathode is two parallel titanium alloy plates, and the anode is sandwiched in the middle. The three are kept at a certain distance from each Other and connected by a high-voltage insulating ceramic. 3 ~ 7 kV DC high voltage is applied to the anode, and the cathode is grounded. The anode and cathode plates are sealed inside the pump body, and the two permanent magnets oppositely placed on the pump body are adsorbed. The direction of the magnetic field is perpendicular to the plate, and the magnetic induction intensity is 1000 to 2000 Gs. Second, the principle of sputtering ion pump First of all, the power to start in the yin and yang plate between the high voltage. As the distance between the stages is very close, according to E = U / d, the electric field strength E is very large, especially at the edge of the anode cylinder wall. Under the action of a strong electric field and a parallel magnetic field, electrons move at high speed in a spiral manner. Due to the increase of the electronic movement stroke, the probability of collision with gas molecules is greatly increased. Electrons collide with gas molecules in space to generate positive ions and secondary electrons. The generated electrons continue to collide with the gas molecules to generate new positive ions and electrons. This discharge is called Penning discharge, Penning discharge can be carried out under very low pressure. Gas molecules are ionized positive ions formed to accelerate to the cathode plate movement, due to the energy is very large, strong impact on the cathode sputtering, a large number of titanium atoms are bombardment, deposition in the anode tube wall and the cathode plate was subjected to ion bombardment In the weaker area, a fresh titanium film is formed to adsorb the active gas, while the inert gas is buried in the area where the cathode sputtering is not strong. Further Reading: pump valve pipe fittings Exhibition 2016 Exhibition of Information Industry, Internet (Xiamen) Technology Co., Ltd. Author: Asian pumps Network Editor: Yao Xiaoxia (QQ / micro letter:) http://beng.liuti.cn/ (Hotline :)
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